NanoBeam nB5

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Published: Monday, 18 May 2020 18:24
Written by Super User
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The nB4 is a generation ahead of the current competition and with its field-proven performance has gained acceptance in the market place. It has excellent stability and has demonstrated an average uptime of greater than 93%. NanoBeam now introduces the nB5 which has been developed to further reduce delivery times and service costs.



nB5 development aims:

  • Refine design and components to reduce routine service requirements.
  • Achieve a machine-fault-downtime of less than 5% annually.
  • Enhance performance
  • Facilitate volume production.

Specification:

  • Beam Voltage range 20kV - 100kV
  • Feature size on resist <8nm
  • Stitching/overlay error <25nm for 500um field
  • Automatic loading 5 chuck airlock system


The nB5 system will provide a platform for further development to high deflection speed and further integrated electronics.

Welcome

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Published: Monday, 18 May 2020 18:23
Written by Super User
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NanoBeam, founded in 2002, has developed breakthrough technology to produce high performance and cost effective electron beam lithography tools. Our innovative designs significantly reduce product cost and therefore the ownership cost without compromising on accuracy or automation.

Small machine size, excellent resistance to stray field, advanced vibration tracking, and low power dissipation result in low cleanroom requirements.

Outstanding mechanical rigidity and fast stage and beam deflection settling result in higher throughput in mix-and-match and direct write. The modern architecture requires fewer mechanical and electronic system components, which simplifies service and makes our products very reliable.

History

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Category: Uncategorised
Published: Monday, 18 May 2020 18:23
Written by Super User
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NanoBeam was founded in.........

First machine order came on.......

First machine shipped on.....

etc.etc.

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