About Us

NanoBeam was formed in 2002 to develop and manufacture advanced electron beam lithography systems. All of the staff have long experience of electron beam systems and have worked in various companies in this field.

Since we offered our first machine for sale, in 2004, we have installed machines at various locations in Europe and Asia. We offer quick delivery and installation times, and tailor-made support for each customer. Where necessary we can adapt our machines to address each customer's particular needs.

NanoBeam Limited is a company registered in England and Wales with company number 4230486 and registered for VAT purposes with number 787046985. For further details on how to contact us, please click here. We look forward to hearing from you.

 

NanoBeam Poster Our latest company poster is available for download, A4 size

 

Welcome

NanoBeam, founded in 2002, has developed breakthrough technology to produce high performance and cost effective electron beam lithography tools. Our innovative designs significantly reduce product cost and therefore the ownership cost without compromising on accuracy or automation.

Small machine size, excellent resistance to stray field, advanced vibration tracking, and low power dissipation result in low cleanroom requirements.

Outstanding mechanical rigidity and fast stage and beam deflection settling result in higher throughput in mix-and-match and direct write. The modern architecture requires fewer mechanical and electronic system components, which simplifies service and makes our products very reliable.

Welcome

NanoBeam, founded in 2002, has developed breakthrough technology to produce high performance and cost effective electron beam lithography tools. Our innovative designs significantly reduce product cost and therefore the ownership cost without compromising on accuracy or automation.

Small machine size, excellent resistance to stray field, advanced vibration tracking, and low power dissipation result in low cleanroom requirements.

Outstanding mechanical rigidity and fast stage and beam deflection settling result in higher throughput in mix-and-match and direct write. The modern architecture requires fewer mechanical and electronic system components, which simplifies service and makes our products very reliable.